Fault detecting method and layout method for semiconductor integrated circuit

ABSTRACT

The present invention provides a fault detecting method and a layout method for a semiconductor integrated circuit. The fault detecting method performs detection for faults in a semiconductor integrated circuit using a fault list corresponding to information on sites in the semiconductor integrated circuit where a fault is likely to occur or information required to reduce such faults. In addition, the fault detecting method and the layout method perform ordering of faults with their likelihood and weighting of the faults, taking into consideration physical information on a mask pattern within a chip or records of actual use of cells or functional blocks.

FIELD OF THE INVENTION

The present invention relates to a fault detecting method and a layoutmethod for a semiconductor integrated circuit, and in particular, to afault detecting method and a layout method for a semiconductorintegrated circuit which can efficiently and accurately performdetection for faults in a semiconductor integrated circuit and lay itout, respectively.

BACKGROUND OF THE INVENTION

In a conventional layout process for a mask pattern for a semiconductorintegrated circuit, a layout device automatically generates a masklayout diagram indicating the physical layout of a mask pattern orwiring for an integrated circuit based on a logically verified circuitnetlist. Since a circuit diagram has no practical physical information,the physical positional relationship in the mask pattern are given onlythrough the layout process. In most cases, the physical positions of themask pattern in the layout are based on timing information on logicaloperations of the integrated circuit.

If, for example, fine foreign matter adheres to a mask during anintegrated circuit manufacturing process, a defect such as a patternbridge occurs in that portion to which the foreign matter adheres. Sucha defect is generally detected by using predetermined test patterns inan integrated circuit detecting step to examine input and outputsignals. An automatic test pattern generator (ATPG) is also known whichautomatically generates such test patterns based on information such asa circuit diagram.

In an advanced integrated circuit, however, the number of test patternsexecuted is limited due to a limitation on an detection time associatedwith costs. Thus, it is important to promptly and efficiently detect adefect (hereafter referred to as a “fault”) in the integrated circuit.Accordingly, it is necessary to determine the probability of detectingfaults in the integrated circuit using certain test patterns, that is,to evaluate a fault coverage. The evaluation of the fault coverage isreferred to as “fault detection” herein. The term “fault detection”herein is sometimes used to express its original meaning, that is,detection for faults.

With a conventional fault detection, the fault coverage is output usinga circuit netlist, or fault list and test patterns. Specifically, thefault detecting means (ATPG) allows a fault state to be artificiallycreated in an interacted circuit, which is then processed by a tester(or a fault detector) to determine whether or not that fault is normallydetected (fault simulation).

The fault list is not only loaded but may also be output as a detectionresult. The fault detecting means (ATPG) uses the circuit netlist or thefault list to automatically generate test patterns, and may also outputthe fault coverage.

Due to a recent increase in the scale of integrated circuits, anenormous amount of test patterns and a large amount of processing timefor fault simulation for the test patterns are required to obtain a highfault coverage. An enormous amount of processing time is also requiredfor the ATPG and a large amount of test patterns are automaticallygenerated by the ATPG. On the other hand, a required fault coverage isincreasing in order to improve the reliability of the integratedcircuit.

When a phenomenon that may cause a fault, for example, adhesion offoreign matter to a mask occurs in a physical area on a chip, this maylead to a fault if the foreign matter sticks to a portion where a maskpattern is present. There are portions in the chip where no mask patternis present, and no fault occurs even if the foreign matter adheres tothese portions.

Typically, the mask pattern is not uniformly present on the chip; themask pattern is dense in some areas, while it is coarse in the otherareas. Consequently, if a phenomenon that may cause a fault occurssubstantially uniformly on the chip, the probability of an actual faultoccurring is not uniform on the chip, but the fault occurrence rate ishigher in a dense portion in the mask pattern than in a coarse portionin the mask pattern.

On the other hand, when, for example, a mask portion for a normal signalline is close to a mask portion for a power line, the integrated circuitis likely to malfunction due to a possible noise from a power supply. Ifsignal lines are close to each other, the integrated circuit is alsolikely to malfunction because a signal of a lower intensity is affectedby a signal of a higher intensity.

Thus, the probability of an actual fault occurring varies depending onmask conditions, that is, the layout, wiring, and the type of the mask.

Furthermore, the possibility of a fault occurring increases if a newprocess, a newly developed cell, or a cell or functional block thereliability of which has not been proved is used.

The conventional fault detection uses only the circuit netlist and testpatterns and does not take the circuit layout or the records of use ofcells or functional blocks into consideration. That is, the faultsimulation is carried out by assuming the possibility of an actual faultoccurring for each fault to be subjected to detection to be constant, sothat the conventional fault coverage may not be accurate enough to be anactual index of the fault occurrence rate. In addition, the conventionalfault detection is inefficient because it does not subject actuallylikely faults to the fault detection or the ATPG before less likelyfaults.

Additionally, due to the ever increasing scale and decreasing size ofrecent integrated circuits, there are expected to be new faults thatcannot be expressed by a conventional single stuck-at fault model. Thatis, the relationship between a defect level in the market and the faultcoverage may not be expressed by a simple equation such as thatdescribed later. A new measure for the fault coverage is thus requiredwhich takes actual faults occurring into account.

Furthermore, the conventional layout method does not take the likelihoodof faults into consideration and takes no mask layout measures forpreventing faults.

SUMMARY OF THE INVENTION

It is thus an object of the present invention to use physicalinformation on a mask pattern in a chip of a semiconductor integratedcircuit and the records of use of cells or functional blocks to enableaccurate and efficient fault detections and layouts based on actualfaults, thereby reducing faults such as initial defects.

A fault detecting method according to the present invention performdetection for faults in a semiconductor integrated circuit using a faultlist corresponding to information on sites of the semiconductorintegrated circuit where a fault is likely to occur or informationrequired to reduce faults. A fault detecting method and a layout methodaccording to the present invention orders faults with their likelihoodand weights them based on this ordering, taking into considerationphysical information on a mask pattern within a chip of thesemiconductor integrated circuit and the records of use of cells orfunctional blocks.

The present invention thus enables accurate and efficient faultdetections and layouts based on actual faults to reduce faults in thesemiconductor integrated circuit such as initial defects.

Repeatedly speaking, the present invention uses the fault listcorresponding to information on sites of the semiconductor integratedcircuit where a fault is likely to occur or information required toreduce faults, to perform detection for faults in the semiconductorintegrated circuit or layout a mask or wiring for the semiconductorintegrated circuit.

The present invention performs detection for faults in the semiconductorintegrated circuit to create a fault list containing information onsites of the semiconductor integrated circuit where a fault is likely tooccur or information required to reduce faults, and use this list toperform detection for faults in the semiconductor integrated circuit orlayout a mask or wiring for the semiconductor integrated circuit.

The present invention omits faults that are difficult to detect in faultdetection and uses the remaining part of the fault list to performdetection for faults in the semiconductor integrated circuit or layout amask or wiring for the semiconductor integrated circuit.

The present invention provides the fault list with data on thelikelihood of each fault.

The present invention uses a fault list containing faults ordered withtheir likelihood to perform detection for faults in the semiconductorintegrated circuit or layout a mask or wiring for the semiconductorintegrated circuit.

The present invention weights faults with their likelihood to determinea fault coverage for a fault detection or for the layout of a mask orwiring for the semiconductor integrated circuit.

The present invention orders faults with their likelihood to weight thembased on this ordering.

The present invention orders or weights faults with their likelihoodbased on mask information obtained from a layout device for laying outthe semiconductor integrated circuit.

The present invention calculates the density of the mask pattern basedon the mask information obtained from the layout device for laying outthe semiconductor integrated circuit, to order or weight faults withtheir likelihood depending on this mask pattern density.

The present invention orders or weights faults with their likelihoodusing a database for reliability determined from the records of past useof cells or functional blocks of the semiconductor integrated circuit.

The present invention calculates a fault coverage that can be obtainedwhen detecting each fault, to remove faults that are not required toachieve a specified fault coverage in the order of the unlikelihood offaults so that detection is performed for the remaining faults.

The present invention calculates a fault coverage while performingdetection for each fault in accordance with the ordering and stops theprocessing once a specified fault coverage has been reached.

The present invention thus uses the fault list corresponding toinformation on sites of the semiconductor integrated circuit where afault is likely to occur, to perform detection for faults in thesemiconductor integrated circuit, and uses the physical information onthe mask pattern in the chip of the semiconductor integrated circuit andthe records of use of cells or functional blocks to order and weight thefaults with their likelihood. As a result, accurate and efficient faultdetections and layouts are enabled based on actual faults, therebyreducing faults in the semiconductor integrated circuit such as initialdefects.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a flow chart showing a process procedure for a layout methodfor loading a fault list according to a first embodiment of the presentinvention;

FIG. 2 is a flow chart showing a process procedure for a layout methodfor loading a fault list generated from fault detections according to asecond embodiment of the present invention;

FIG. 3 is a flow chart showing a process procedure for a fault detectingmethod and a layout method according to a third embodiment of thepresent invention;

FIG. 4 is a logic circuit diagram useful in explaining a fault detectingmethod and a layout method according to a fourth embodiment of thepresent invention;

FIG. 5 is a fault list corresponding to the logic circuit diagram inFIG. 4;

FIG. 6 is a fault list ordered based on the likelihood of faults in thelogic circuit diagram in FIG. 4;

FIG. 7 is a flow chart showing a process procedure for a fault detectingmethod according to a fourth embodiment of the present invention;

FIG. 8 is a flow chart showing a process procedure for a layout methodaccording to the fourth embodiment of the present invention;

FIG. 9 is a view showing main portions of a fifth embodiment of thepresent invention in which the logic circuit diagram in FIG. 4 isreplaced with a mask layout diagram;

FIG. 10 is a flow chart showing a process procedure for a faultdetecting method according to a fifth embodiment of the presentinvention;

FIG. 11 is a flow chart showing a process procedure for a layout methodaccording to the fifth embodiment of the present invention;

FIG. 12 is a logic circuit diagram useful in explaining ordering of afault list according to the fifth embodiment of the present invention;

FIG. 13 is a view showing main portions in which the logic circuitdiagram in FIG. 12 is replaced with a mask layout diagram;

FIG. 14 is a flow chart showing a process procedure for a faultdetecting method according to a sixth embodiment of the presentinvention;

FIG. 15 is a chart illustrating a list of mask densities according tothe sixth embodiment of the present invention;

FIG. 16 is a flow chart showing a process procedure for a layout methodaccording to the sixth embodiment of the present invention;

FIG. 17 is a chart illustrating a use record database for cells orfunctional blocks according to a seventh embodiment of the presentinvention;

FIG. 18 is a flow chart showing a process procedure for a faultdetecting method according to the seventh embodiment of the presentinvention;

FIG. 19 is a flow chart showing a process procedure for a layout methodaccording to the seventh embodiment of the present invention;

FIG. 20 is a chart illustrating the concept of weighting of faultsaccording to an eighth embodiment of the present invention;

FIG. 21 is a flow chart showing a process procedure for a faultdetecting method according to a ninth embodiment of the presentinvention;

FIG. 22 is a chart showing a specific example of weighting of faultsaccording to the ninth embodiment of the present invention;

FIG. 23 is a chart showing a specific example where determinations ofwhether or not faults have been detected are added to the weighting ofthe faults in FIG. 22;

FIG. 24 is a flow chart showing a process procedure for a faultdetecting method according to a tenth embodiment of the presentinvention;

FIG. 25 is a chart showing a specific example of a weighted fault listaccording to the tenth embodiment of the present invention;

FIG. 26 is a flow chart showing a process procedure for a faultdetecting method according to an eleventh embodiment of the presentinvention;

FIG. 27 is a flow chart showing a process procedure for a faultdetecting method according to a twelfth embodiment of the presentinvention;

FIG. 28 is a flow chart showing a process procedure for a faultdetecting method according to a thirteenth embodiment of the presentinvention;

FIG. 29 is a chart illustrating a fault list containing possible faultcoverages according to a thirteenth embodiment of the present invention;

FIG. 30 is a flow chart showing a process procedure for a layout methodaccording to the thirteenth embodiment of the present invention;

FIG. 31 is a flow chart showing a process procedure for a faultdetecting method and a layout method according to a fourteenthembodiment of the present invention;

FIG. 32 is a flow chart showing a process procedure in a failing sitededuction means according to a fifteenth embodiment of the presentinvention;

FIG. 33 is a flow chart showing a process procedure for outputting siteswhere a fault is likely to occur according to the fifteenth embodimentof the present invention;

FIG. 34 is a logic circuit diagram illustrating a semiconductor circuitfor which test patterns are generated according to a first example of amethod for sorting out a suspected failing site according to the presentinvention;

FIG. 35 is a view showing an example of a test pattern;

FIG. 36 is a chart showing an example of a fail log for the circuit inFIG. 34;

FIG. 37 is a chart showing another example of a fail log for the circuitin FIG. 34;

FIG. 38 is a chart showing yet another example of a fail log for thecircuit in FIG. 34;

FIG. 39 is a chart showing boundary conditions for the circuit in FIG.34;

FIG. 40 is a flow chart showing a process procedure for fail logprocessing according to the first example of a method for sorting out asuspected failing site according to the present invention;

FIG. 41 is a flow chart of a second example of a method for sorting outa suspected failing site according to the present invention;

FIG. 42 is a chart showing an example of a fault table indicating likelyfaults according to the second example of a method for sorting out asuspected failing site according to the present invention;

FIG. 43 is a flow chart of a third example of a method for sorting out asuspected failing site according to the present invention;

FIG. 44 is a flow chart showing a process procedure executed by afailing site deduction means according to a sixteenth embodiment of thepresent invention;

FIG. 45 is a flow chart showing a process procedure for a general faultanalysis according to the sixteenth embodiment of the present invention;

FIG. 46 is a diagram showing a variation of the process procedure inFIG. 44;

FIG. 47 is a flow chart showing another example of a process procedureexecuted by the fault site deduction means according to the presentinvention;

FIG. 48 is a diagram showing a conventional layout process for a maskpattern;

FIG. 49 is a flow chart showing a process procedure for a conventionalfault detection; and

FIG. 50 is a schematic view showing an example of a distribution of amask pattern for an integrated circuit.

DESCRIPTION OF THE PREFERRED EMBODIMENTS Description of the Prior Art

Before explaining the embodiments of the present invention, the priorart will be described with reference to the drawings.

As shown in FIG. 48, a layout device 102 automatically generates a masklayout diagram 104 indicating the physical layout of a mask pattern orwiring for an integrated circuit, based on a circuit netlist 101 thathas already been logically verified. Since the circuit diagram has noactual physical information, the physical positional relationship in themask pattern is not given until a layout process is started. In mostcases, the physical positional relationship in the mask pattern in thelayout are based on timing information 103 on logic operations of theintegrated circuit.

If, for example, fine foreign matter adheres to a mask in an integratedcircuit manufacturing process, a defect such as a pattern bridge occursin that portion to which the foreign matter adheres. Such a defect isgenerally detected by using predetermined test patterns in an integratedcircuit detecting step to examine input and output signals. An automatictest pattern generator (ATPG) is also known which automaticallygenerates such test patterns based on information such as a circuitdiagram.

In an advanced integrated circuit, however, the number of test patternsexecuted is limited due to a limitation on an detection time associatedwith costs. Thus, it is important to promptly and efficiently detect adefect in the integrated circuit. Accordingly, it is necessary todetermine the probability of detecting faults in the integrated circuitusing certain test patterns, that is, to evaluate a fault coverage.

FIG. 49 shows a flow chart of a conventional fault detection. The faultcoverage is output using a circuit netlist 201, or fault list 203 andtest patterns 204.

Specifically, a fault detecting means (ATPG) 202 allows a fault state tobe artificially created in an integrated circuit, which is thenprocessed by a tester (or a fault detector) to determine whether or notthat fault is normally detected (fault simulation).

The fault list is not only loaded but may also be output as a detectionresult. The fault detecting means (ATPG) 202 uses the circuit netlist orthe fault list 203 to automatically generate test patterns 204, and mayalso output a fault coverage 205.

Due to a recent increase in the scale of integrated circuits, anenormous amount of test patterns and a large amount of processing timefor fault simulation for the test patterns are required to obtain a highfault coverage. An enormous amount of processing time is also requiredfor the ATPG and a large amount of test patterns are automaticallygenerated by the ATPG. On the other hand, a required fault coverage isincreasing in order to improve the reliability of the integratedcircuit.

On the other hand, a defect level in the market and the fault coverageare conventionally expressed by Equation (1), shown below, where Udenotes the defect level in the market, K denotes the fault coverage,and Y denotes a yield.U=1−Y ^((1-K)) ²

-   -   U: Defect level in the market    -   K: Fault coverage    -   Y: Yield

The fault coverage is based on a model for a single degenerative fault,that is, a 0 degenerative fault and a 1 degenerative fault. The 0degenerative fault is assumed to be a fault in which a signal line isfixed to zero, for example, a case where the signal line is bridged overa mask for a VSS (ground) power supply. Many faults other than thebridge across a signal line and a power supply can be expressed by asimilar model; all faults can conventionally be expressed by Equation(1).

When a phenomenon that may cause a fault, for example, adhesion offoreign matter to a mask occurs in a physical area on a chip, this maylead to a fault if the foreign matter sticks to a portion where a maskpattern is present. The chip has portions where no mask pattern ispresent, and no fault occurs if the foreign matter adheres to theseportions.

Typically, the mask pattern is not uniformly present on the chip; themask pattern is dense in some areas, while it is coarse in the otherareas. Consequently, if a phenomenon that may cause a fault occurssubstantially uniformly on the chip, the probability of an actual faultoccurring is not uniform on the chip, but the fault occurrence rate ishigher in dense portions in the mask pattern than in coarse portions inthe mask pattern.

It is assumed that a rectangular chip has portions with a mask patternand portions without the mask pattern distributed thereon as shown inFIG. 50. In this figure, the mask pattern is present in the “portionswith the mask pattern”, which are shaded, while it is absent in the“portions without the mask pattern”, which are not shaded. When theentire rectangular chip is divided vertically and laterally into fourblocks A, B, C, and D, the density of the mask pattern in each block,that is, the ratio of the area occupied by the mask pattern to theentire area differs among the blocks. In FIG. 50, the density of themask pattern is highest in a block B and lowers in the order of blocksD, A, and C. The crosses in the figure indicate sites that cause afault, and portions with a low mask pattern density have a low faultoccurrence rate despite a phenomenon that may cause a fault. Oncontrary, portions with a high mask pattern density have a high faultoccurrence rate with the same phenomenon that may cause a fault. Forexample, in FIG. 50, due to its higher density than the block A, theblock B has a higher rate at which a fault occurs actually when aphenomenon that may cause a fault is present.

On the other hand, when, for example, a mask for a normal signal line isclose to a mask for a power line, the integrated circuit is likely tomalfunction due to a possible noise from a power supply. If signal linesare close to each other, the integrated circuit is also likely tomalfunction because a signal of a lower intensity is affected by asignal of a higher intensity.

Thus, the probability of an actual fault occurring varies depending onmask conditions, that is, the layout, wiring, and the type of the mask.

Furthermore, the possibility of a fault occurring increases if a newprocess, a newly developed cell, or a cell or functional block thereliability of which has not been proved is used.

The conventional fault detection uses only the circuit netlist and testpatterns and does not take the circuit layout or the records of use ofcells or functional blocks into consideration, as shown in FIGS. 48 and49. That is, fault simulation is carried out by assuming the possibilityof an actual fault occurring for each fault to be subjected to detectionto be constant, so that the conventional fault coverage may not beaccurate enough to be an actual index of the fault occurrence rate. Inaddition, the conventional fault detection is inefficient because itdoes not subject actually likely faults to the fault detection or theATPG before less likely faults.

Additionally, due to the ever increasing scale and decreasing size ofrecent integrated circuits, there are expected to be new faults thatcannot be expressed by the conventional single stuck-at fault model.That is, the relationship between the defect level in the market and thefault coverage may not be expressed by the above Equation (1). A newmeasure for the fault coverage is thus required which takes actualfaults occurring into account.

Furthermore, the conventional layout method does not take the likelihoodof faults into consideration and takes no mask layout measures forpreventing faults.

Description of the Embodiments of the Invention

The embodiments of the present invention will be described below withreference to the drawings.

FIG. 1 is a diagram useful in explaining a first embodiment. Faultsoccurring in the integrated circuit vary depending on mask conditions,that is, the layout, wiring, and the type of the mask. They also varydepending on the level of records of use of cells and functional blocksin use. The fault occurrence rate of sites where a fault is likely tooccur can be lowered by modifying the layout of the mask or the wiring.When, for example, a mask for a normal signal line is close to a maskfor a power line, the integrated circuit is likely to malfunction due toa possible noise from a power supply. In this case, the possibility of afault occurring can be reduced by increasing the interval between thepower line and the mask.

In the prior art, a layout means 402 simply automatically generates amask layout diagram 404 indicating the physical layout of a mask patternor wiring for an integrated circuit based on a circuit netlist 401.According to the first embodiment of the present invention, the layoutmeans 402 loads a fault list 403 containing information on sites of thesemiconductor integrated circuit where a fault is likely to occur orinformation required by the layout means 402 to reduce faults. Theinformation on sites where a fault is likely to occur may be generatedby the layout means 402. The fault list 403 contains information such ascloseness between masks, proximity to a power mask, proximity to asignal mask for supplying a clock, many overlappings of a contact, andcrossing of vertically adjacent signal lines. In this case, the mask islaid out, the fault list is then generated, and the layout means 402take certain measures again to reduce faults. In addition, if, forexample, the layout means 402 takes certain measures for a possiblefailing site that has been insufficiently detected for faults, this siteis contained in fault list 403.

FIG. 2 is useful in explaining a second embodiment of the presentinvention. In this embodiment, faults are detected to create a faultlist. If the result of the fault detection indicates that there arefaults undetected, new test patterns must be added. Once the faultcoverage has increased to a certain level, an enormous amount of time isrequired to create test patterns to further increase the fault coverageand the test patterns involve a large number of steps. Even the ATPG maygenerate very long test patterns or may not automatically generate suchtest patterns. That is, it is difficult to achieve a fault coverage of100% and in most cases, undetected faults remain. These undetectedfaults are missed even if they are occurring actually because there areno test patterns that can detect them. Certain measures must be taken tominimize the occurrence of such faults.

Thus, according to the second embodiment, a fault list 502 output from afault detecting means 501 is loaded in a layout means 504, which takescertain measures to reduce faults. This results in a mask layout diagram505 for which the measures have been taken to reduce faults. In thismanner, by using the mask layout to compensate for the insufficiency ofthe fault detection, defects are prevented from occurring and efficientfault detections are enabled.

The fault list 502 generated by the fault detecting means 501 containundetected faults, faults that cannot necessarily be detected, andfaults that a fault detecting device have given up processing due to alarge amount of time required for the processing. Specifically, thefault list 502 defines physical coordinate data on a layoutcorresponding to these faults.

FIG. 3 is useful in explaining a third embodiment of the presentinvention. One of the reasons why a large amount of processing time isrequired for the fault detection is faults that are difficult to detector cannot be detected.

In the fault detection, the detection time required to detect each faultis not uniform and varies significantly depending on how easily thefault is detected or the amount of events occurring during thedetection. If a large amount of events occur during the detection, theload on hardware for a fault detector increases the amount of processingtime. The fault detection is more effective when test patterns that aremore likely to be detected or faults that can be more easily detectedare processed before faults that require a larger amount of processingtime due to events or when another measures are taken without processingthe latter faults.

Some of the faults in the circuit that are difficult to detect areknown. For example, flipflop pins on scan lines in a scan design, andsystem clock, set and reset pins, as well as control pins for tri-statecells for generating a signal unstable state may affect the circuit overa wide range if faults are set for these pins, thereby generating alarger number of events during the detection than if faults are set fornormal detection sites.

The third embodiment of the present invention omits faults that mayincrease the processing time from the fault list before the other faultsare subjected to the fault detection, and takes certain measures forreducing faults in a mask layout for omitted fault, thereby reducing theentire man hour and thus the defect level in the market.

Specifically, a difficult-to-detect fault list removing means 602 omitsfaults contained in a difficult-to-detect fault list 603 from a faultlist 601 containing all faults to be subjected to detection, whileeffectively detection is performed for the other faults 606 (607). Thenames of cell instances, masks, or the like on the layout correspondingto the difficult-to-detect fault list 603 are then specified. Testpatterns 608 are input to the fault detecting means 607 for normal faultdetections, whereas the test patterns 608 can be automatically generatedby the ATPG. For faults difficult to detect, a layout means 604 lays outthe mask or wiring so as to reduce actual faults, to generate a masklayout diagram 605.

FIGS. 4 to 8 are useful in explaining a fourth embodiment of the presentinvention. With a netlist such as that shown in FIG. 4, a fault listcontaining faults to be subjected to detection is as shown in FIG. 5.

The fault detection is a process for detecting actual defects. Thecurrent fault detection is based on a circuit netlist to use a uniformlikelihood for all faults to be subjected to detection. The likelihoodof a fault, however, is actually not uniform but vary depending onphysical factors of the mask or the like. Thus, to detect and deductiondefects, which are an original objective, during a fault detection,faults that are likely to occur actually must be preferentiallyprocessed. Additionally, the ATPG must efficiently automaticallygenerate patterns for detecting faults that are likely to occuractually.

Accordingly, in the fourth embodiment, a fault list ordered with thelikelihood of faults as shown in FIG. 6 is loaded in the fault detectingmeans so that the circuit for example, in FIG. 4 can be effectivelydetected or detected by the ATPG for faults. Specifically, as shown inFIG. 7, an ordered fault list 1003 is loaded in a fault detecting means1002 so that detection can be efficiently done for faults to output anaccurate fault coverage 1005. With the ATPG, a fault 1003 ordered basedon a circuit netlist 1001 is used to generate efficient test patterns1004 while outputting the accurate fault coverage 1005.

On the other hand, the likelihood of defects can be reduced for siteswhere a fault is likely to occur by appropriately laying out the maskthe wiring. In the fourth embodiment, an ordered fault list is loadednot only in the fault detecting means but also in the layout means toreduce the likelihood of defects, as shown in FIG. 8. Specifically, anordered fault list 1103 is loaded in the layout means 1102, and the maskand wiring are laid out so as to diminish the likelihood of defects togenerate a mask layout diagram 1104. Reference numeral 1101 denotes acircuit netlist. An ordering criteria may be loaded in the layout means1102 so that the ordered fault list 1103 can be generated from analready laid-out mask based on this criteria.

FIGS. 9 to 13 show a fifth embodiment of the present invention. FIG. 9is assumed to show part of a mask layout diagram that has been replacedfor the circuit diagram shown in FIG. 4. The shaded portion in FIG. 9shows a mask constituting a power supply. Fault sites H and O in FIG. 4correspond to masks H and O in FIG. 9. In this case, H is close to thepower mask. With a fine foreign matter X, H is more likely to undergo ashort circuit than O. H is also likely to be affected by noise from thepower mask. That is, H has a higher possibility of faults than O. Thedifference in the possibility of faults results from the difference inthe layout of the mask the wiring between the two failing sites.

Thus, in the fifth embodiment, a fault list is ordered with thelikelihood of actual faults based on mask information in the mask meansso that in accordance with this order, detection is preferred for faultsor the layout means takes certain measures to prevent actual faults.Specifically, the process is carried out as shown in FIG. 10. First, alayout means 1301 layouts the mask and the wiring. A target fault list1304 is ordered based on available mask information 1302 (1303).Detection is performed for the faults based on this ordered fault list1305 (1306) so that an accurate fault coverage 1308 can be efficientlyoutput depending on the likelihood of actual faults. With the normalfault detection, test patterns 1307 are input to a fault detecting means1306. With the ATPG, the test patterns 1307 are automatically generated.

On the other hand, in FIG. 11, a layout means 1401 orders a fault list1404 based on mask information 1402 (1403), and appropriately arrangesthe mask and lays out the wiring in sites where a fault is likely tooccur actually through a layout means 1406, to generate a final masklayout diagram 1407.

A specific method for ordering the fault list will be described withreference to the circuit diagram in FIG. 12 and the mask layout diagramin FIG. 13. When wires on the mask are close to each other, faultsarising from a short circuit or crosstalk are likely to occur.Accordingly, as shown in FIG. 13, the distance Y between the wires iscalculated from information on layout coordinates in the mask layout toorder faults in such a manner that their likelihood increases with adecrease in the distance between the wires. If, for example, five sites1, 2, 3, 4, and 5 in FIG. 12 are in the order of 3, 1, 5, 2, and 4 withthe distance between wires, a fault is determined to be more likely tooccur in this order.

If a mask for a power supply is close to a normal signal line, the powersupply may cause noise in the signal line, which may thus becomedefective. The shaded portion in FIG. 13 denotes the power line. Asshown in FIG. 13, the power line is first identified based on theinformation on the arrangement coordinates in the mask layout and thedistance X between the power line and the signal line is calculated fromthe information on the layout coordinates, so that the fault list isordered with the likelihood of faults in such a manner that thelikelihood increases with a decrease in the distance between the lines.

If, for example, five sites 1, 2, 3, 4, and 5 in FIG. 12 are in theorder of 3, 1, 2, 5, and 4 based on the distance between wires, a faultis determined to be more likely to occur in this order.

If a signal line for supplying a cock is close to a normal signal line,the power supply may similarly cause noise in the former signal line,which may thus become defective. In this case, the fault list is orderedin such a manner similar to that described above, by providing thelayout device with information on the signal line for supplying a clock.

When many signal lines are crossed over using contacts on the masks,they are likely to be open circuited due to defects in the contacts.Accordingly, as shown in FIG. 13, the same wire is retrieved from thesignal line information from the mask layout, the number of contacts iscounted, and the fault list is ordered in such a manner that thelikelihood of faults increases consistently with the number of contacts.In FIG. 13, a wire C has contacts O, P, Q, and R and the number ofcontacts is thus four. If, for example, five sites 1, 2, 3, 4, and 5 inFIG. 12 are in the order of 5, 2, 3, 1, and 4 based on the number ofcontacts, a fault is determined to be more likely to occur in thisorder.

If signal lines cross each other on the mask, these wires may be shortcircuited. In FIG. 13, wires A and C cross each other at S. Wires B andC also cross each other at T. Thus, in FIG. 13, the cross state of eachof the signal lines (between vertically adjacent layers) in the masklayout is examined and the number of crosses is counted to order thefault list in such a manner that the likelihood of faults increasesconsistently with the number of crosses in a signal line betweenvertically adjacent layers. If, for example, five sites 1, 2, 3, 4, and5 in FIG. 12 are in the order of 3, 2, 5, 1, and 4 based on the numberof crosses in a signal line between vertically adjacent layers, a faultis determined to be more likely to occur in this order.

FIGS. 14 to 16 show a sixth embodiment of the present invention. Asdescribed above, the density of the mask pattern in FIG. 50 is higher inthe order of C, A, D, and B. The likelihood of faults is higher in thesame order. The sixth embodiment thus orders the fault list with thedensity of the mask pattern. The density of the mask pattern iscalculated using the following equation:MD=MS×100/BS(%)where MD denotes the density of the mask pattern, MS denotes the area ofa mask pattern portion within a specified block, and BS denotes the areaof the specified block.

A specific process flow will be described with reference to FIG. 14.First, a layout means 1701 generates mask information 1702. Then, a masklayout diagram is divided based on blocking information 1704 fordividing the mask layout diagram into individual cells, functionalblocks, or other specified blocks, and the mask density of each of theobtained blocks is calculated (1703). A fault list 1707 is ordered basedon a list 1705 of mask densities for the generated blocks (1706),detection is performed for the faults based on the ordered fault list1708 (1709), and an accurate fault coverage 1711 obtained taking thelikelihood of actual faults into consideration is output. With thenormal fault detection, test patterns 1710 are input to a faultdetecting means 1709. With the ATPG, the test patterns 1710 areautomatically generated. FIG. 15 shows an example of the mask densitylist 1705. In this example, a block 1 has a mask pattern density of 90%.The fault is ordered in such a manner that target faults are arranged inthe ascending order of the mask pattern density.

In the process in FIG. 16, the fault list is similarly ordered with themask pattern density, but based on information in the ordered faultlist, a mask array and wiring layout means takes certain measures forsites where an actual fault is likely to occur. That is, the mask layoutdiagram is divided based on mask information 1902 from a layout means1901 as well as blocking information 1904, and the mask density of eachobtained block is calculated (1903). A fault list 1907 is ordered basedon a list 1905 of mask densities for the generated blocks (1906), andbased on information in the ordered fault list 1908, the mask and wiringlayout means 1909 takes certain measures for sites where an actual faultis likely to occur, thereby generating a final mask layout diagram 1910.

FIGS. 17 to 19 show a seventh embodiment of the present invention.

If a new process, a cell that has been newly developed but has fewrecords of use, or a cell or functional block the reliability of whichhas not been proved is used in the integrated circuit, a fault is likelyto occur. The fault detection or layout must take such records of pastuse into consideration. The method shown in the seventh embodimentassemble records of past use of cells, functional blocks, or the likeinto a database so that these records of use can be taken into accountduring the fault detection and the mask layout to obtain an accuratefault coverage depending on the likelihood of actual faults and to takescertain measures for sites where an actual fault is likely to occur.

FIG. 17 shows a specific example of a database. This database comprisesthe names of cells or functional blocks used in an integrated circuit,the number of times that each block has been used in the circuit, thenumber of past defects if any, the status of each block in reliabilitytests, and the number of successful processes inside the integratedcircuit. For the reliability test status, for example, the mark “⊚”indicates that predetermined criteria have been met, the mark “◯”indicates that the criteria have not been met because the reliabilitytest has not been completed, and the mark “Δ” indicates that a problemhas been found through the reliability test.

FIG. 18 shows a specific process flow. A fault list 2102 ordering means2101 loads information from a cell and block use record database 2103and orders target faults. Detection is performed for faults is performedfor the faults based on the ordered fault list 2104 (2105) to output anaccurate fault coverage 2107 depending on the likelihood of actualfaults. With the normal fault detection, test patterns 2106 are input toa fault detecting means 2105. With the ATPG, the test patterns 2106 areautomatically generated.

In FIG. 19, the fault list is ordered based on the functional block userecord database as in FIG. 18, but in this case, based on information inthe ordered fault list, a mask and wiring layout means takes certainmeasures for sites where an actual fault is likely to occur.Specifically, a fault list 2202 is ordered based on information in acell and functional block use record database 2203 (2201), and based onthe ordered fault list 2204, a mask and wiring layout means 2205 takescertain measures for sites where an actual fault is likely to occur,thereby generating a final mask layout diagram 2206.

FIG. 20 shows an eighth embodiment of the present invention.

The fault coverage is a measure indicating how easily a target fault canbe detected in a test pattern used, and is calculated during the faultdetection. The target fault must originally have a possibility ofoccurring actually. Possible faults, however, are not uniform in theirlikelihood. Some possible faults are more likely to occur than others.The conventional fault detecting means, however, does not take thelikelihood of actual faults into consideration but processes themuniformly. That is, likely and unlikely faults are equally processed sothat whenever a target fault is detected, the fault detection isincremented and otherwise it is considered to be undetected.

In this case, even when an unlikely fault is detected to increment thefault detection, the possibility of a fault occurring actually increasesif a likely fault, that is, a fault to be noted has not been detected.An original object of the fault coverage is to detect actual faults. Toachieve this object, the test patterns must allow likely faults to bepreferentially detected. That is, for the fault coverage, likely faultsmust be imparted with a higher weight than unlikely faults.

In FIG. 20, if there are a number of target faults including one faultat point A, zero fault at point A, and one fault at point B, each targetfault is conventionally equally weighted. With the likelihood of actualfaults taken into account, however, the faults must weighted; in thisfigure, the average value of the weight is set at 1.0 so that forexample, the one fault and zero fault at the point A are set at 0.2because they are unlikely to occur, whereas the one fault at the point Bis set at 1.8 because it is likely to occur actually.

The relationship between the defect level in the market and the faultcoverage is conventionally expressed by the above described Equation(1). This equation treats a fault as a single degenerative one, but dueto the ever increasing scale and decreasing size of recent integratedcircuits, there are expected to be new faults that cannot be expressedby the conventional single stuck-at fault model. That is, it is likelythat the relationship between the defect level in the market and thefault coverage will be unable to be expressed by Equation (1). A newmeasure for the fault coverage is thus important which weights faultstaking the occurrence of actual faults into consideration. Such ameasure enables the relationship between the fault coverage and thedefect level in the market to be more correctly derived, therebyreducing the defect level in the market.

FIGS. 21 to 23 show a ninth embodiment of the present invention. Aspecific method for the above described weighting of faults will beshown.

That is, target faults are ordered with their likelihood so that weightson the faults are varied at a fixed rate in accordance with thisordering. A specific process procedure is shown in FIG. 21. An orderingmeans 2401 orders a fault list 2402, and a fault weighting means 2404weights the generated ordered fault list 2403. Detection is performedfor faults is performed for the faults based on the generated weightedfault list 2405 (2406) to calculate an accurate fault coverage 2408taking the weighting into consideration. With the normal faultdetection, test patterns 2407 are input to a fault detecting means 2406.With the ATPG, the test patterns 2407 are automatically generated.

In FIG. 21, detection is performed for the faults based on the weightedfault list, but they may be weighted after the normal fault detection,which does not involve the weighting, thereby recalculating an accuratefault coverage using the weighting.

FIG. 22 shows a specific example of the weighting. The rate ofvariations in weighting is expressed by:d=2/(n+1)where d denotes the rate of variations in weighting and n denotes thenumber of target faults, which is 39 in the example in FIG. 22. The rateof variations in weighting is 2/(39+1)=0.05. One fault at a point L isimparted with the lowest weight of 0.05. Zero fault at a point K isimparted with the second lowest weight of 0.10, which is determined byadding 0.05 to the weight on the fault at the point L. Zero fault at apoint T is imparted with an intermediate weight of 1.0. One fault at apoint H is imparted with the highest weight of 1.95.

Next, a specific fault coverage is calculated. As shown in FIG. 23, theweighted faults are assumed to be detected or undetected. Theconventional method for calculating the fault coverage simply calculatesit from the total number of faults and the number of detected faults.$\begin{matrix}{{Conventional}\quad{failure}} \\{{detection}\quad{rate}}\end{matrix} = {\frac{{Number}\quad{of}\quad{detected}\quad{failures}}{{Total}\quad{number}\quad{of}\quad{failures}} \times 100(\%)}$The fault coverage obtained according to the present invention takingthe weighting into account is calculated as shown in Equation (3).$\begin{matrix}{{Failure}\quad{detection}\quad{rate}} \\{{based}\quad{on}\quad{weighting}}\end{matrix} = {\frac{\begin{matrix}{1.95 + 1.90 + 1.80 + \ldots +} \\{1.00 + \ldots + 0.05}\end{matrix}}{\begin{matrix}{{Total}\quad{of}\quad{weights}} \\\left( {{total}\quad{number}\quad{of}\quad{failures}} \right)\end{matrix}} \times 100(\%)}$That is, the fault coverage is calculated by adding a weight on eachdetected fault to the total weight or the total number of faults in sucha manner that 1.95+1.90+1.80+ . . . +1.00+ . . . 0.05.

FIGS. 24 and 25 show a tenth embodiment of the present invention. Alsoin this embodiment, a specific example of the fault weighting is shown.The mask density of a cell or a functional block is calculated based onmask information obtained from the layout means, and faults are thenweighted with the ratio of this mask density to an average valuecorresponding to the mask density of the entire integrated circuit.

A specific process flow will be explained with reference to FIG. 24.First, a layout means 2701 generates mask information 2702. Then, a masklayout diagram is divided based on blocking information 2704 fordividing the mask layout diagram into individual cells or functionalblocks, and the mask density of each obtained block is calculated (2703)to generate a list 2705 of mask densities for the blocks. Thecalculation means 2703 also generates the mask density of the entirechip of the target integrated circuit (hereafter referred to as an“average mask density”). Each of the target faults shown in the faultlist 2707 is weighted with the ratio of the mask density of eachgenerated block to the average value (2706). Each fault is weighteddepending on the mask density of a cell or a functional clock directlyaffecting this fault. Detection is then performed for the faults basedon the weighted fault list 2708 (2709) to output an accurate faultcoverage 2711 taking the weighting into consideration. With the normalfault detection, test patterns 2710 are input to a fault detecting means2709. With the ATPG, the test patterns 2710 are automatically generated.

In FIG. 24, detection is performed for the faults based on the weightedfault list, but they may be weighted after the normal fault detection,which does not involve the weighting, thereby recalculating an accuratefault coverage using the weighting.

FIG. 25 shows an example of a weighted fault list. The mask density ofone chip, corresponding to the average mask density, is 1.0. The maskdensity of a cell or a functional block is determined based on its ratioto the average value, and is directly used for the weighting. Eachtarget fault is weighted according to the mask density of a cell or afunctional clock directly affecting this fault. For example, a fault Arelates to a block A, which is imparted with a weight of 0.9, so thatthe fault A is also imparted with a weight of 0.9.

FIG. 26 shows an eleventh embodiment of the present invention. Also inthis embodiment, a specific example of the fault weighting is shown.According to this embodiment, faults are weighted based on records ofpast use of cells, functional blocks, or the like used in an integratedcircuit. For example, the above described database shown in FIG. 17 isused for the records of past use of the cells, functional blocks, or thelike. In FIG. 17, a fault is imparted with a higher weight as acorresponding cell or functional block has lower records of use, moredefects in the past, or more problems found through reliability tests,or has undergone less processes. FIG. 17 shows records of use of cellsor functional blocks, but each target fault is weighted based on therecords of past use of a cell or a functional block directly affectingthis failing site.

According to the procedure in FIG. 26, a fault list 2902 is weightedbased on use record database 2903 for cells or functional blocks (2901).Detection is performed for the faults (2905) on the weighted fault list2904 to output an accurate fault coverage 2907 taking the weighting intoaccount. With the normal fault detection, test patterns 2906 are inputto a fault detecting means 2905. With the ATPG, the test patterns 2906are automatically generated.

In FIG. 26, detection is performed for the faults based on the weightedfault list, but they may be weighted after the normal fault detection,which does not involve the weighting, thereby recalculating an accuratefault coverage using the weighting.

FIG. 27 shows a twelfth embodiment of the present invention. Also inthis embodiment, a specific example of the fault weighting is shown.According to this embodiment, faults are weighted based on maskinformation obtained from a layout means. Specifically, the weighting isbased, for example, on the ordering of the fault list described abovewith reference to the mask diagrams in FIGS. 12 and 13.

FIG. 27 shows a specific process procedure. First, a fault list 3004 isweighted based on mask information 3002 generated by a layout means 3001(3003). Detection is performed for faults is performed for the faults(3006) on the weighted fault list 3005 to output an accurate faultcoverage 3008 taking the weighting into account. With the normal faultdetection, test patterns 3007 are input to a fault detecting means 3006.With the ATPG, the test patterns 3007 are automatically generated. InFIG. 27, detection is performed for the faults based on the weightedfault list, but they may be weighted after the normal fault detection,which does not involve the weighting, thereby recalculating an accuratefault coverage using the weighting.

FIGS. 28 to 30 show a thirteenth embodiment of the present invention.Since the fault detection is time-consuming, this process is desirablyefficiently carried out by omitting faults that are unlikely to occuractually. Thus, when faults are ordered and weighted with theirlikelihood, faults that must be subjected to detection can bepreferentially processed and a fault coverage can be calculated whichmay be obtained if each target fault is detected. The method accordingto this embodiment provides a fault coverage to be achieved, andsequentially extracts faults required to obtain this fault coverage inthe order of their likelihood while treating the remaining target faultsas unwanted to avoid processing them, thereby achieving an effectivefault detection.

FIG. 28 shows a specific process procedure. In this case, a fault listordering means 3101 orders a fault list 3102. A fault weighting means3104 weights the generated fault list 3103 and calculates a possiblefault coverage (3105) to generate a fault list 3106 including thepossible fault coverage. A fault coverage to be achieved is alsospecified (3108) and unwanted faults are deleted from the fault list3106 (3107). Detection can be then performed for the remaining faultsbased on the fault list 3109 (3110) to effectively output an accuratefault coverage 3112 taking the weighting into consideration. With thenormal fault detection, test patterns 3111 are input to a faultdetecting means 3110. With the ATPG, the test patterns 3111 areautomatically generated.

FIG. 29 shows an example of the fault list 3106 including the possiblefault coverage as in the above described example in FIG. 22. When onlyone fault at a point H is detected, since the total number of faults is39, the possible fault coverage is 1.95×100/39=5.0%. Likewise, whenfaults up to one at a point I have been detected, the possible faultcoverage is 9.9%. Further, when faults up to zero at a point K, where afault is unlikely to occur, have been detected, the possible faultcoverage is 99.9%. Moreover, when all the faults, including one at apoint L, where a fault is most unlikely to occur, have been detected,the possible fault coverage is 100%. Then, when 15% is specified for atarget fault coverage, faults up to one at a point G need to bedetected.

FIG. 30 shows the same process as FIG. 28 before unwanted faults aredeleted, but in this case, for the remaining part of the fault list, amask and wiring layout means takes certain measures for sites where anactual fault is likely to occur. That is, a fault list 3302 is ordered(3301), the faults in the generated fault list 3303 are weighted (3304),and a possible fault coverage is calculated (3305). Unwanted faults areremoved from the generated fault list 3306 in accordance with a faultcoverage 3308 to be achieved (3307). A layout means 3310 takes certainmeasures for the remaining part 3309 of the fault list to generate afinal mask layout diagram 3311.

FIG. 31 shows a fourteenth embodiment of the present invention. In theabove described thirteenth embodiment, to effectively perform detectionfor the faults, the faults unnecessary for the fault coverage to beachieved are removed before the fault detection. According to thisembodiment, however, instead of omitting the unwanted faults beforehand,it is checked during the fault detection whether the target faultcoverage has been reached so that once the target has been reached, thefault detection is stopped despite the remaining faults.

FIG. 31 shows a specific process procedure. First, a fault list orderingmeans 3401 orders a fault list 3402. Then, a fault weighting means 3404weights the generated fault list 3403 to generate a weighted fault list3405. This fault list is used to perform detection for the faults(3406). At the beginning of the fault detection, a target fault coverageis specified (3407). During the fault detection 3406, each time a targetfault has been processed, it is checked whether the specified faultcoverage has been reached (3408). If it has not been reached, the nexttarget fault is processed. On the other hand, if the target faultcoverage has been reached, the fault detecting process is ended tooutput a final fault coverage 3409 taking the weighting intoconsideration. With the normal fault detection, test patterns 3410 areinput to a fault detecting means 3406. With the ATPG, the test patterns3410 are automatically generated.

The fault list may be output once the fault coverage specified by thefault detecting means has been reached so that the layout means can takecertain measures based on this fault information to generate the finalmask layout diagram.

Next, a further fault detecting method according to the presentinvention will be described.

An detection device called a “tester” is generally used to performdetection for faults in a semiconductor integrated circuit. Informationincluding time, a signal status, and a signal detecting terminal whichis output by the tester when the semiconductor integrated circuitmalfunctions is collectively called a “fail log”. As described below, itis a main object of the present invention to simply and accuratelyextract suspected failing sites from a netlist in a relatively shorttime by changing measuring conditions in the tester to modify a faillog, comprehensively analyzing a plurality of fail logs, or addingphysical layout information on the mask layout and wiring.

FIGS. 32 and 33 shows a fifteenth embodiment of the present invention.Wires may actually be close to each other on a mask layout diagramthough they appear to be mutually apart from each other on a circuitnetlist as shown in FIGS. 12 and 13. That is, if a wire 2 in FIG. 12corresponds to a wire A in FIG. 13 and a wire 4 in FIG. 12 correspondsto a wire B in FIG. 13, the wires 2 and 4 appear to be relatively apartfrom each other but in FIG. 13, the wires A and B are adjacent to eachother. If crosses on the wires 2 and 4 in FIG. 12 are assumed to besuspected failing sites, these faults are apparently irrelevant to eachother on FIG. 12 but since the masks are close to each other on FIG. 13,these faults can be assumed to be relevant to each other; they are, forexample, wiring short circuits. In this manner, the relevancy betweenfaults, which is not clear on the circuit netlist, may be evident on theactual physical mask layout. Physical components on the actual masklayout must be taken into account for actual faults.

Although conventional fault diagnosis systems perform detection forfaults using only a circuit netlist and a simulator, the fault detectingmethod according to the present invention carries out the process alsousing layout information on the mask and wiring layout. FIG. 32 shows aflow chart according to the present invention. A fail log 901 outputfrom a tester 801 and mask information 903 including wire types such asthe VDD power line and the normal signal line as well as layoutcoordinate values which information is obtained from a layout device 902are input to a fault diagnosis system 904 to deduction and outputsuspected failing sites (905). The fault diagnosis system 904 sorts outsuspected failing sites and then sends information to the layout device902 to obtain required wire types and layout coordinate values.

Alternatively, in addition to the identification of failing sites, themask information 903 including wire types and layout coordinate valueswhich information is obtained from the layout device 902 is used as aninput to determine the likelihood of the faults (3300) in order tooutput a list 3301 of types of likely faults and likely failing sites,as shown in FIG. 33.

Next, the identification of suspected failing sites by the faultdiagnosis system 904 will be described in detail. The present inventioneliminates the disadvantage that if a fail log of rejected samplesvaries depending on evaluation conditions in the tester and thisvariation is not taken into account, the number of suspected failingsites may increase depending on the evaluation conditions in the faillog in use, thereby requiring a large amount of time to deductionfailing sites. The present invention also eliminates the disadvantagethat if the physical positional relationship among the sorted-outsuspected failing sites on the layout is not taken into considerationand if many fault sources are present as a result of the identification,then it is difficult to automatically deduction actual physical failingsites, thereby forcing an operator to view relevant portions of the masklayout diagram to guess failing sites.

FIGS. 34 to 40 show first example of a method for sorting out suspectedfailing sites according to the present invention. In this case, the testpatterns shown in FIG. 35 are used to check whether or not a singledegenerative fault is present in the semiconductor integrated circuitshown in FIG. 34. In FIG. 34, P1 to P4 denote external input signallines and P5 and P6 denote external output signal lines. At points oftime 1 to 5 in FIG. 35, when the test pattern shown in the input sectionin the figure is input to the signal lines P1 to P4, the signal lines P5and P6 output signals as shown by the expected values in the figure ifthere is no fault in the circuit.

FIG. 36 to 38 show output results (fail logs) of evaluation of thecircuit in FIG. 34 by the tester in which a fault may occur in thecircuit when a measuring voltage is varied. The marked letters H and Lindicate that the results differ from the expected values in FIG. 35.FIG. 39 shows variations in the operation of the semiconductorintegrated circuit which occur when the measuring voltage is varied. Inthis figure, “Pass” indicates that no fault is present and that thecircuit is operating as expected, whereas “Fail” indicates that afailing site is present in the semiconductor integrated circuit, whichis not operating as expected. The output results in FIG. 39 show thatwhen the measuring voltage is 0, 1, or 2 V, the semiconductor integratedcircuit is operating correctly as shown in FIG. 35. At 2.5 V, however, afault occurs in which a signal on the signal line A becomes 1. In thiscase, the results in the output fail log are as shown in FIG. 36. Whenthe measuring voltage is raised to 3 V, a fault occurs in which thesignal becomes 1 at a point H in FIG. 34, and the results in the outputfail log are as shown in FIG. 37. When the measuring voltage is furtherraised to 3.5 V, a fault occurs in which the signal becomes 1 at a pointD in FIG. 34, and the results in the output fail log are as shown inFIG. 38.

In this manner, when the measuring voltage is changed, the failing siteschange and increase to change the output results (the fail log). In thiscase, since the fail log obtained at a voltage of 3 or 3.5 V arises froma plurality of failing sites, if this fail log is used with the currentsystem, a large amount of time may be required to deduction the failingsites, resulting in incorrect identification. On the other hand, at 2.5V, corresponding to a boundary condition under which a failing siteappears in the fail log in FIG. 39, only the effect of one fault at thepoint A in FIG. 2 appears in the fail log, so that the failing sites canbe easily sorted out using the current system. During the process, thetester 801 varies the measuring conditions, and a fail log processingmeans 802 detects the boundary condition to output the current fail log803, which is passed to a failing site storage means 810. The measuringconditions may include temperature, frequency, and the like in additionto voltage.

The failing sites stored in the failing site storage means 810 in thismanner are used to provide the test patterns used in the detection,expected values are set only for the failing sites identified by thetester, and fault simulation is carried out to deduction suspectedfailing sites to output faults that have affected more failing sites, asfinal suspected ones.

FIGS. 41 and 42 show a second example of identification of suspectedfailing sites by the above described fault diagnosis system 904. Variousfaults occur in a semiconductor integrated circuit, and fail logs outputas a result of tester measurements thus have a certain tendency. If, forexample, the fail log does not vary despite variations in frequency, afault independent of frequency, for example, a degenerative fault isguessed. On the contrary, if the fail log varies when the frequency isvaried, a fault dependent on frequency, for example, crosstalk isguessed. On the other hand, if the fault depends on the measuringconditions, a plurality of parameters may affect it. In this case, thefault is assumed to depend on these parameters. If a fault results from,for example, a minor current leakage, it affects both measured voltageand temperature parameters. Accordingly, the possibility of minorleakage can be estimated by checking fail logs obtained at differentmeasuring conditions. If an identical fail log is obtained with aplurality of parameters, an identical failing site is assumed to bedetected.

The approach described with reference to FIGS. 41 and 42 uses alikely-fault table such as that shown in FIG. 42. References A and B inFIG. 42 denote measuring parameters such as voltage. In FIG. 42, “A”indicates that the fail log depends on the parameter A. “!A” indicatesthat the fail log is independent of the parameter A. If, for example,the parameter A corresponds to voltage and the parameter B correspondsto frequency, then “A&!B” denotes an α fault that depends on voltage butis independent of frequency.

FIG. 41 shows a process flow. In this process, the measuring conditionsare varied in the tester 801, which uses two parameters such as theparameters A and B, and a fail log processing means 4501 determinesdependency on the measuring conditions to output the result of thedetermination and a fail log for the boundary condition if the result isaffirmative or an invariable fail log if the result is negative. Theresult of the determination and a fail log 4502 for the parameter A andthe result of the determination and a fail log 4503 for the parameter Bwhich are all output by the fail log processing means 4501 are used asan input, and diagnosis means 4504 compares these determination resultsand fail logs together to guess the types of likely faults from a faulttable 4505 in the form shown in FIG. 42 (4506), the fault table beingheld as a database. If the fail logs are exactly the same, informationindicating the match is also output. In this manner, the type and siteof the fault can be guessed from the fail log information from thetester.

FIG. 43 shows a third example of a method by which the fault diagnosissystem 904 sorts out suspected failing sites. Again, a method with twoparameters such as the parameters A and B will be explained. Themeasuring conditions are varied in the tester 801, and the fail logprocessing means 4501 determines dependency on the measuring conditionsto output the result of the determination and a fail log for theboundary condition if the result is affirmative or an invariable faillog if the result is negative. The result of the determination and thefail log 4502 for the parameter A and the result of the determinationand the fail log 4503 for the parameter B which are all output by thefail log processing means 4501 are used as an input, and adiagnosis/fail log processing means 4601 compares these determinationresults and fail logs together to guess the types of likely faults fromthe fault table 4505 in the form shown in FIG. 42 (4603), the faulttable being held as a database. The diagnosis/fail log processing means4601 comprehensively analyzes the fail logs 4502 and 4503 to extractduplicates from the fail logs to generate a fail log 4602 and passes itto a failing site storage means 4101 of the fault diagnosis system todeduction suspected failing sites. Thus, since the required informationis obtained from the fail logs to guess the types and sites of faults inorder to comprehensively analyze the fail logs for a plurality ofmeasuring conditions, the fault diagnosis system can subsequentlyefficiently deduction suspected failing sites and improve diagnosisaccuracy.

FIGS. 44 to 46 shows a sixteenth embodiment of the present invention.The sixteenth embodiment uses fail logs for the process as in thefifteenth embodiment, but further uses mask information obtained from alayout device for physically laying out the mask layout and wiring, toguess and order suspected faults to deduction failing sites. FIG. 44shows a procedure for this process.

In FIG. 44, reference numeral 4101 denotes the failing site storagemeans, reference numeral 4102 denotes a correspondence table generatingmeans, reference numeral 4103 denotes a correspondence table storagemeans, reference numeral 4104 denotes a correspondence table retrievingmeans, reference numeral 4105 denotes an initial suspected fault storagemeans, reference numeral 4106 denotes a failing site deduction means,and reference numeral 4107 denotes a final suspected fault displaymeans.

First, the fail site storage means 4101 stores failing sites identifiedby the tester when detecting the target semiconductor integrated circuitbut for which an output signal from the circuit does not match acorresponding expected value to be obtained when no fault is present. Onthe other hand, fault simulation is carried out in which the testpattern used for the detection is used to determine whether or not thetarget fault can be detected in the circuit. The correspondence tablegenerating means 4102 generates a correspondence table indicatingfailing sites in the circuit and a point of time and an external pin atwhich each of the faults is first detected, and the correspondence tablestorage means 4103 stores the created correspondence table. Theretrieval means 4104 checks the individual failing sites stored in thefailing site storage means 4101 against the contents of thecorrespondence table stored in the correspondence table storage means4103 to extract all corresponding faults from the correspondence tableas initial suspected faults, and the initial suspected fault storagemeans 4105 stores information on the initial suspected faults. Thefailing site deduction means 4106 provides the initial suspected faultswith the test patterns used in the detection, sets expected values onlyfor the failing sites identified by the tester, and carries out faultsimulation to deduction suspected failing sites to output faults thathave affected more failing sites, as final suspected ones. The finalsuspected fault display means 4107 then displays the final suspectedfaults, corresponding to the results of diagnosis by the failing sitededuction means 4106.

In this case, the suspected faults stored in the initial suspected faultstorage means 4105 are ordered with their likelihood based on the maskinformation 903 obtained from the layout device 902 (910). The orderingmethod is as described above. Fault simulation is further executed toselect from the fault sites (4106) to thereby select from the suspectedfailing sites. Although the fault simulation is time-consuming, theinitial suspected faults obtained from the correspondence tableretrieving means 4104 are ordered so that the most suspected faults arefirst processed, thereby enabling actual failing sites to be promptlysorted out while generally avoiding time-consuming useless faultsimulation.

As shown in FIG. 45, an electron beam tester 1201 or a scanning electronmicroscope 1202 is typically used to deduction physical sites of faultsand check fault conditions after the fault diagnosis system has beenused for a netlist to deduction suspected failing sites (1200). Theseoperations, however, are time-consuming. Accordingly, the most suspectedfailing sites must first be processed.

Thus, according to the present method, an attempt is made to deductionsuspected failing sites, and even if a plurality of suspected failingsites remain finally, since they have been ordered with theirlikelihood, the most suspected fault is first processed in accordancewith this order. Consequently, an electron beam tester or a scanningelectron microscope can be effectively used.

FIG. 46 shows a variation of the embodiment shown in FIG. 44. In thiscase, the failing site deduction means 4106 orders the suspected faultswith their likelihood based on information obtained from the layoutdevice, thereby providing effects similar to those in the embodiment inFIG. 44. In addition, since the layout information 902 is used as in theabove described fifteenth embodiment, the types of the sorted-outsuspected faults can be guessed.

FIG. 47 is a diagram useful in explaining a method for detecting faultsin the semiconductor integrated circuit, the method sorting out failingsites by varying the measuring conditions in the tester tocomprehensively analyze fail logs for the plurality of measuringconditions and adding physical layout information on the mask or wiringlayout to guess and order suspected faults with their likelihood. Inthis case, failing sites are sorted out by varying the measuringconditions in the tester 801 to comprehensively analyze fail logs forthe plurality of measuring conditions (4501) and adding physical layoutinformation 903 on the mask or wiring layout obtained from the layoutmeans 902, to guess and order suspected faults with their likelihood(910). Fail log information 4602 is stored in the failing site storagemeans 4101. The suspected fault ordering means 910 uses the suspectedfaults in the initial suspected fault storage means 4105 as an input toorder them, and the failing sites are passed to the failing sitededuction means 106 in accordance with this order. As described above,by comprehensively analyzing the fail logs for the plurality ofmeasuring conditions set in the tester 801 and adding the physicalinformation on the mask layout or wiring, the types of the suspectedfaults can be efficiently guessed and the failing sites can beefficiently sorted out.

Thus, by processing fail logs, used as an input for fault diagnosis, toreduce faults to be diagnosed, the time required for the deduction canbe reduced. The fail log information can also be used to guess the typesof faults. Additionally, by adding physical information on the mask orwiring layout, the types of suspected faults can be efficiently guessedand failing sites can be accurately sorted out.

1.-22. (canceled)
 23. A layout method for a semiconductor integratedcircuit, characterized in that: a fault list corresponding toinformation on sites of a semiconductor integrated circuit where a faultis likely to occur or information required to reduce faults is used toperform mask layout and wiring for said semiconductor integratedcircuit.
 24. The layout method for a semiconductor integrated circuitaccording to claim 23, wherein the fault list contains data onlikelihood of each fault.
 25. The layout method for a semiconductorintegrated circuit according to claim 24, wherein the mask layout andthe wiring are performed for the semiconductor integrated circuit usinga fault list ordered with the likelihood of each fault.
 26. The layoutmethod for a semiconductor integrated circuit according to claim 24,wherein the faults are weighted with their likelihood to determine afault coverage for the mask layout and wiring for the semiconductorintegrated circuit.
 27. The layout method for a semiconductor integratedcircuit according to claim 26, wherein the faults are ordered with theirlikelihood and are weighted in accordance with this ordering.
 28. Thelayout method for a semiconductor integrated circuit according to claim25, wherein the faults are ordered or weighted with their likelihoodbased on mask information obtained from a layout device for laying outthe semiconductor integrated circuit.
 29. The layout method for asemiconductor integrated circuit according to claim 25, wherein adensity of a mask pattern is calculated based on mask informationobtained from the layout device for laying out the semiconductorintegrated circuit, and the faults are ordered or weighted with theirlikelihood depending on the density of the mask pattern.
 30. The layoutmethod for a semiconductor integrated circuit according to claim 25,wherein the faults are ordered or weighted with their likelihood using adatabase for reliability based on records of past use of cells orfunctional blocks of the semiconductor integrated circuit.
 31. Thelayout method for a semiconductor integrated circuit according to claim27, wherein a fault coverage that can be obtained when detecting eachfault is calculated, faults that are not required to achieve a specifiedfault coverage are deleted in the order of the unlikelihood of thefaults, and detecting process is conducted for the remaining faults. 32.The layout method for a semiconductor integrated circuit according toclaim 27, wherein the fault coverage is calculated while carrying out aprocess for each fault detection in accordance with the ordering, andthe process is stopped once the specified fault coverage has beenreached.
 33. A layout method for a semiconductor integrated circuit,characterized in that: detection is performed for faults in asemiconductor integrated circuit to create a fault list indicatinginformation on sites of a semiconductor where a fault is likely to occuror information required to reduce faults so that this fault list can beused to perform mask layout and wiring for said semiconductor integratedcircuit.
 34. The layout method for a semiconductor integrated circuitaccording to claim 33, wherein the fault list contains data onlikelihood of each fault.
 35. The layout method for a semiconductorintegrated circuit according to claim 34, wherein the mask layout andthe wiring are performed for the semiconductor integrated circuit usinga fault list ordered with the likelihood of each fault.
 36. The layoutmethod for a semiconductor integrated circuit according to claim 34,wherein the faults are weighted with their likelihood to determine afault coverage for the mask layout and wiring for the semiconductorintegrated circuit.
 37. The layout method for a semiconductor integratedcircuit according to claim 36, wherein the faults are ordered with theirlikelihood and are weighted in accordance with this ordering.
 38. Thelayout method for a semiconductor integrated circuit according to claim35, wherein the faults are ordered or weighted with their likelihoodbased on mask information obtained from a layout device for laying outthe semiconductor integrated circuit.
 39. The layout method for asemiconductor integrated circuit according to claim 35, wherein adensity of a mask pattern is calculated based on mask informationobtained from the layout device for laying out the semiconductorintegrated circuit, and the faults are ordered or weighted with theirlikelihood depending on the density of the mask pattern.
 40. The layoutmethod for a semiconductor integrated circuit according to claim 35,wherein the faults are ordered or weighted with their likelihood using adatabase for reliability based on records of past use of cells orfunctional blocks of the semiconductor integrated circuit.
 41. Thelayout method for a semiconductor integrated circuit according to claim37, wherein a fault coverage that can be obtained when detecting eachfault is calculated, faults that are not required to achieve a specifiedfault coverage are deleted in the order of the unlikelihood of thefaults, and detecting process is conducted for the remaining faults. 42.The layout method for a semiconductor integrated circuit according toclaim 37, wherein the fault coverage is calculated while carrying out aprocess for each fault detection in accordance with the ordering, andthe process is stopped once the specified fault coverage has beenreached.
 43. A layout method for a semiconductor integrated circuit,characterized in that: faults that are difficult to detect are omittedfrom a fault list before mask layout and wiring are performed based onthe remaining part of the fault list for the semiconductor integratedcircuit.
 44. The layout method for a semiconductor integrated circuitaccording to claim 43, wherein the fault list contains data onlikelihood of each fault.
 45. The layout method for a semiconductorintegrated circuit according to claim 44, wherein the mask layout andthe wiring are performed for the semiconductor integrated circuit usinga fault list ordered with the likelihood of each fault.
 46. The layoutmethod for a semiconductor integrated circuit according to claim 44,wherein the faults are weighted with their likelihood to determine afault coverage for the mask layout and wiring for the semiconductorintegrated circuit.
 47. The layout method for a semiconductor integratedcircuit according to claim 46, wherein the faults are ordered with theirlikelihood and are weighted in accordance with this ordering.
 48. Thelayout method for a semiconductor integrated circuit according to claim45, wherein the faults are ordered or weighted with their likelihoodbased on mask information obtained from a layout device for laying outthe semiconductor integrated circuit.
 49. The layout method for asemiconductor integrated circuit according to claim 45, wherein adensity of a mask pattern is calculated based on mask informationobtained from the layout device for laying out the semiconductorintegrated circuit, and the faults are ordered or weighted with theirlikelihood depending on the density of the mask pattern.
 50. The layoutmethod for a semiconductor integrated circuit according to claim 45,wherein the faults are ordered or weighted with their likelihood using adatabase for reliability based on records of past use of cells orfunctional blocks of the semiconductor integrated circuit.
 51. Thelayout method for a semiconductor integrated circuit according to claim47, wherein a fault coverage that can be obtained when detecting eachfault is calculated, faults that are not required to achieve a specifiedfault coverage are deleted in the order of the unlikelihood of thefaults, and detecting process is conducted for the remaining faults. 52.The layout method for a semiconductor integrated circuit according toclaim 47, wherein the fault coverage is calculated while carrying out aprocess for each fault detection in accordance with the ordering, andthe process is stopped once the specified fault coverage has beenreached.
 53. The fault detecting method for a semiconductor integratedcircuit, the method comprising: limiting one of a type of fault and aposition of fault on the basis of a detection change resulting from achange of a detection condition.
 54. A fault detecting method for asemiconductor integrated circuit, the method comprising: limiting one ofa type of fault and a position of fault on the basis of a faul logchange resulting from a change of a detection condition.
 55. A faultdetecting method for a semiconductor integrated circuit, the methodcomprising: limiting one of a type of fault and a position of fault byutilizing a fail position conditioned to initiate failing when adetection condition is changed to change a fail log.
 56. A faultdetecting method for a semiconductor integrated circuit, the methodcomprising: limiting one of a type of fault and a position of fault byjudging a change of each detection condition when a plurality ofdetection conditions are changed.
 57. A fault detecting method for asemiconductor integrated circuit, the method comprising: limiting one ofa type of fault and a position of fault by judging a change of a faillog in each detection condition when a plurality of detection conditionsare changed.